@Article{KostovBarrUeda:2007:NuSiMa,
               author = "Kostov, K. G. and Barroso, Joaquim Jos{\'e} de and Ueda, 
                         M{\'a}rio",
          affiliation = "{Faculdade de Engenharia de Guaratinguet{\'a}. Universidade 
                         Estadual Paulista (UNESP.FEG)} and {Instituto Nacional de 
                         Pesquisas Espaciais (INPE)} and {Instituto Nacional de Pesquisas 
                         Espaciais (INPE)}",
                title = "Numerical simulation of magnetic field enhanced plasma immersion 
                         ion implantation",
              journal = "Surface and Coatings Technology",
                 year = "2007",
               volume = "In press",
             keywords = "PIII, Computer Simulation, Magnetic field, Ion Implantation.",
             abstract = "The behavior of plasma and sheath characteristics under the action 
                         of an applied magnetic field is important in many applications 
                         including plasma probes and material processing. Plasma immersion 
                         ion implantation (PIII) has been developed as a fast and efficient 
                         surface modification technique of complex shaped three-dimensional 
                         objects. The PIII process relies on the acceleration of ions 
                         across a high-voltage plasma sheath that develops around the 
                         target. Recent studies have shown that the sheath dynamics is 
                         significantly affected by an external magnetic field. In this work 
                         we describe a two-dimensional computer simulation of magnetic 
                         field enhanced plasma immersion implantation system. Negative bias 
                         voltage is applied to a cylindrical target located on the axis of 
                         a grounded cylindrical vacuum chamber filled with uniform nitrogen 
                         plasma. An axial magnetic field is created by a solenoid installed 
                         inside the cylindrical target. The computer code employs the Monte 
                         Carlo method for collision of electrons and neutrals in the plasma 
                         and a particle-in-cell (PIC) algorithm for simulating the movement 
                         of charged particles in the electromagnetic field. Secondary 
                         electron emission from the target subjected to ion bombardment is 
                         also included. It is found that a high-density plasma region is 
                         formed around the cylindrical target due to the intense background 
                         gas ionization by the magnetized electrons drifting in the crossed 
                         ExB fields. An increase of implantation current density in front 
                         of high density plasma region is observed.",
                 issn = "0257-8972",
             language = "en",
           targetfile = "numerical simulation.pdf",
        urlaccessdate = "03 maio 2024"
}